The effect of the graded bilayer design on the strain depth profiles and microstructure of Cu/W nano-multilayers

The properties and thermal stability of thin films nano-multilayers (NMLs) are generally governed by the in-depth stress (strain) gradients rather than average state. effect strain gradient variation in Cu/W NMLs on between 400 800 °C was investigated. distribution NML stacks varied combining bilayers with different Cu W thicknesses either 3 or 10 nm. A recently developed method based in-plane grazing X-ray diffraction adopted to extract depth profiles. In addition, evolution during growth monitored an in-situ wafer curvature technique. mean residual stresses were found be independent disposition bilayer substacks. On contrary, profile nanolayers strongly depend substacks NML, which resulted outflow characteristics upon annealing. Moreover, application units within stack also provides innovative pathway for producing nanocomposites graded mechanical properties.